Informationen für
 

Silicon nitride films

Thin films of silicon nitride are widely used in microelectronics, optoelectronics, optics and hard surface coatings. For the production of effective silicon solar cells reflection losses and surface recombination have to be minimised.
Thin plasma polymerised SiN films are used to improve both, the reflection behaviour by adjusting the refractive index of the anti-reflexion coating and the surface properties to avoid recombination at and near to the surface.
Further advantages of the silicon nitride films are their hardness and chemical resistivity. For this reason they can be applied as insulator material and barrier layer in many industrial applications.

Contact Person
Name: Dr.-Ing. Andreas Schulz